Semiconductor process metrology

See electrodeposition as it happens.

FabSight is developing operando optical metrology and AI-assisted analysis for semiconductor electrodeposition, starting with copper feature filling on patterned wafers.

SpatialLocal process response
OperandoDuring active deposition
Physics + AIInterpretable process trajectories
Optical response
Electrochemical sync

Bulk signals can hide local failure.

Feature geometry, additives, transport and surface evolution interact during plating. FabSight is being built to reveal where those differences emerge across a patterned surface, including collective optical trajectories from repeated features smaller than the diffraction limit.

Technology

A measurement platform built around the deposition process.

FabSight combines synchronized optical imaging, electrochemical control and physics-informed, AI-assisted analysis to turn patterned substrates into information-rich process experiments.

01

Operando optical measurement

Track optical response across the substrate while potential and current are controlled, retaining the time and spatial information lost in a single electrode-wide signal.

02

Synchronized electrochemistry

Link image sequences to potential, current, waveform and process conditions so optical transitions can be interpreted against the electrochemical experiment.

03

AI-assisted trajectory analysis

Use dimensionality reduction, clustering and predictive models to interpret complex time- and potential-dependent optical trajectories, including spatially averaged signals from repeated sub-diffraction feature populations.

The FabSight workflow

From process condition to spatial process insight.

The initial platform is designed for process development rather than production-line deployment. It is intended to help teams compare chemistries, process windows and patterned test structures while extracting reproducible optical trajectories that evolve with the deposition itself.

  1. 1
    RunControlled plating experiment
  2. 2
    ObserveSynchronized optical + electrochemical data
  3. 3
    InterpretPhysics-informed + AI-assisted trajectory analysis
  4. 4
    ValidateConnect signals to independent deposit outcomes

Applications

Designed for the questions process-development teams actually ask.

FabSight's first development focus is copper electrodeposition, with a platform architecture intended to extend to other metals and geometries as the measurement is validated.

01 / Interconnects

Damascene process development

Compare how additive chemistry and process conditions affect patterned feature populations during copper growth.

02 / Packaging

TSV & advanced packaging plating

Evaluate spatial differences across larger recessed structures where geometry and transport can strongly influence filling behavior.

03 / Chemistry

Plating chemistry development

Generate time-resolved, spatial evidence for how suppressors, accelerators, levelers and other bath variables alter the deposition response.

Current stage

Building the first company-owned platform.

FabSight is at an early development stage. The current program is focused on building and validating an Alpha-1 instrument, separating useful interfacial and growth information from thickness and roughness effects, and developing AI-assisted methods to identify reproducible optical trajectories across patterned substrates.

NowPrototype design, optical/electrochemical integration and trajectory-analysis development
NextControlled copper deposition studies, sub-diffraction feature-population analysis and independent morphology validation
PartnerSeeking semiconductor process-development and chemistry-development conversations

Company

Electrochemistry, optics and data analysis in one development platform.

FabSight is an Oregon-based semiconductor metrology startup developing tools for observing and understanding electrodeposition on patterned substrates. The company combines electrochemistry, optical measurement and AI-assisted data analysis around a simple premise: process development is more informative when the measurement can reveal where, when and how different growth trajectories emerge.

Gary S. Harlow, Ph.D., Founder and Technical Lead at FabSight

Founder & Technical Lead

Gary S. Harlow, Ph.D.

Electrochemist and surface-science researcher working across electrochemical interfaces, operando optical measurements, semiconductor electrodeposition and data-driven interpretation of dynamic process signals.

Work with FabSight

Interested in electrodeposition metrology?

We're interested in conversations with semiconductor process-development teams, plating-chemistry suppliers, equipment developers and early technical partners exploring new ways to understand electrodeposition.

info@fabsight.tech